Etching and acidifying graphene oxide membranes to increase gas permeance while retaining molecular sieving ability,AIChE Journal

当前位置： X-MOL 学术 › AlChE J. › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

Etching and acidifying graphene oxide membranes to increase gas permeance while retaining molecular sieving ability
AIChE Journal ( IF 3.5 ) Pub Date : 2020-08-11 , DOI: 10.1002/aic.17022
Liang Huang ₁ , Weiguang Jia ₁ , Haiqing Lin ₁

Affiliation

Graphene oxide (GO) nanosheets stacked in parallel with subnanometer channels can exhibit an excellent size‐sieving ability for membrane‐based gas separation. However, gas molecules have to diffuse through the tortuous nanochannels, leading to low permeability. Herein we demonstrate two versatile approaches to modify the GO (before membrane fabrication by vacuum‐filtration) to collectively increase gas permeability, etching using hydrogen peroxide to generate in‐plane nanopores and acidifying using hydrochloric acid. For example, a membrane prepared at a pH of 5.0 using the 4‐h‐etched GO (HGO‐4h) shows He permeability of 5.3 Barrer and He/CH₄ selectivity of 800, which are 5 times and 1.5 times those of the GO membranes, respectively. Decreasing the pH from 5.0 to 2.0 for HGO‐4h enhances He permeability to 57 Barrer and He/CH₄ selectivity to 1,800. The HGO‐4h prepared at the pH of 2.0 exhibits separation properties of H₂/CO₂, H₂/N₂, He/N₂, and He/CH₄ surpassing their corresponding upper bounds.

中文翻译：

对氧化石墨烯膜进行蚀刻和酸化以增加气体渗透性，同时保持分子筛分能力

与亚纳米通道平行堆叠的氧化石墨烯（GO）纳米片具有出色的尺寸筛选能力，可用于基于膜的气体分离。然而，气体分子必须扩散通过曲折的纳米通道，导致低渗透性。本文中，我们展示了两种通用的方法来修改GO（在真空过滤膜制造之前）以共同提高透气性，使用过氧化氢进行蚀刻以生成面内纳米孔并使用盐酸进行酸化。例如，使用4h蚀刻的GO（HGO-4h）在pH为5.0的条件下制备的膜的He渗透性为5.3 Barrer和He / CH ₄选择性为800，分别是GO膜的5倍和1.5倍。对于HGO-4h，将pH从5.0降低到2.0可将He渗透性提高到57 Barrer，将He / CH ₄选择性提高到1,800。在2.0的pH值下制备的HGO-4h表现出H ₂ / CO ₂，H ₂ / N ₂，He / N ₂和He / CH _4的分离特性超过其相应的上限。

更新日期：2020-08-11

点击分享查看原文

点击收藏

阅读更多本刊新发论文本刊介绍/投稿指南