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Understanding the Conversion Process of Magnetron-Deposited Thin Films of Amorphous ReOx to Crystalline ReO3 upon Thermal Annealing
Crystal Growth & Design ( IF 3.2 ) Pub Date : 2020-07-16 , DOI: 10.1021/acs.cgd.0c00848 Boris Polyakov 1 , Edgars Butanovs 1 , Andrejs Ogurcovs 2 , Sergei Vlassov 3 , Martins Zubkins 1 , Inga Jonane 1 , Arturs Cintins 1 , Aleksandr Kalinko 1, 4 , Alexei Kuzmin 1 , Juris Purans 1
Crystal Growth & Design ( IF 3.2 ) Pub Date : 2020-07-16 , DOI: 10.1021/acs.cgd.0c00848 Boris Polyakov 1 , Edgars Butanovs 1 , Andrejs Ogurcovs 2 , Sergei Vlassov 3 , Martins Zubkins 1 , Inga Jonane 1 , Arturs Cintins 1 , Aleksandr Kalinko 1, 4 , Alexei Kuzmin 1 , Juris Purans 1
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Thin films of rhenium trioxide (ReO3) were produced by reactive DC magnetron sputtering from a metallic rhenium target, followed by annealing in the air in a range of temperatures from 200 to 350 °C. Nanocrystalline single-phase ReO3 films were obtained after being annealed at about 250 °C. The thin films appeared bright red in reflected light and blue-green in transmitted light, thus showing an optical transparency window in the spectral range of 475–525 nm. The film exhibited a high conductivity as evidenced by macro- and nanoscale conductivity measurements. The long-range and local atomic structures of the films were studied in detail by structural methods, such as X-ray diffraction and X-ray absorption spectroscopy. The oxidation state (6+) of rhenium was confirmed by X-ray photoemission and X-ray absorption spectroscopy. The nanocrystalline morphology of the annealed films was evidenced by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and atomic force microscopy (AFM). The obtained results allowed us to propose a mechanism of rhenium oxide conversion from the initially amorphous ReOx phase to cubic ReO3.
中文翻译：
了解热退火后磁控沉积非晶ReO x薄膜向晶体ReO 3的转化过程
通过反应性DC磁控溅射从金属rh靶制备三氧化rh（ReO 3）薄膜，然后在空气中于200至350°C的温度范围内进行退火。纳米晶单相ReO 3在约250°C退火后获得薄膜。薄膜在反射光下呈现鲜红色，在透射光下呈现蓝绿色，因此显示了在475-525 nm光谱范围内的光学透明窗口。如宏观和纳米级电导率测量所证明的，该膜表现出高电导率。通过X射线衍射和X射线吸收光谱等结构方法对薄膜的远距离和局部原子结构进行了详细研究。通过X射线光发射和X射线吸收光谱法确认了的氧化态（6+）。通过扫描电子显微镜（SEM），透射电子显微镜（TEM）和原子力显微镜（AFM）证明了退火膜的纳米晶形态。x相至立方ReO 3。
更新日期：2020-09-02
中文翻译：
了解热退火后磁控沉积非晶ReO x薄膜向晶体ReO 3的转化过程
通过反应性DC磁控溅射从金属rh靶制备三氧化rh（ReO 3）薄膜，然后在空气中于200至350°C的温度范围内进行退火。纳米晶单相ReO 3在约250°C退火后获得薄膜。薄膜在反射光下呈现鲜红色，在透射光下呈现蓝绿色，因此显示了在475-525 nm光谱范围内的光学透明窗口。如宏观和纳米级电导率测量所证明的，该膜表现出高电导率。通过X射线衍射和X射线吸收光谱等结构方法对薄膜的远距离和局部原子结构进行了详细研究。通过X射线光发射和X射线吸收光谱法确认了的氧化态（6+）。通过扫描电子显微镜（SEM），透射电子显微镜（TEM）和原子力显微镜（AFM）证明了退火膜的纳米晶形态。x相至立方ReO 3。
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