Robustness to High Temperatures of Al2O3-Coated CsPbBr3 Nanocrystal Thin Films with High-Photoluminescence Quantum Yield for Light Emission,ACS Applied Nano Materials

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Robustness to High Temperatures of Al2O3-Coated CsPbBr3 Nanocrystal Thin Films with High-Photoluminescence Quantum Yield for Light Emission
ACS Applied Nano Materials ( IF 5.3 ) Pub Date : 2020-07-16 , DOI: 10.1021/acsanm.0c01525
Milan Palei ₁ , Muhammad Imran ₁ , Giulia Biffi _{1,

2} , Liberato Manna ₁ , Francesco Di Stasio ₁ , Roman Krahne ₁

Affiliation

Lead-halide perovskite nanocrystals are a promising material in optical devices due to their high photoluminescence (PL) quantum yield, excellent color purity, and low stimulated emission threshold. However, one problem is the stability of the nanocrystal films under different environmental conditions and under high temperatures. The latter is particularly relevant for device fabrication if further processes that require elevated temperatures are needed after the deposition of the nanocrystal film. In this work, we study the impact of a thin oxide layer of Al₂O₃ on the light emission properties of thin nanocrystal films. We find that nanocrystals passivated with quaternary ammonium bromide ligands maintain their advantageous optical properties in alumina-coated films and do not suffer from degradation at temperatures up to 100 °C. This is manifested by conservation of the PL peak position and line width, PL decay dynamics, and low threshold for amplified spontaneous emission. The PL remains stable for up to 100 h at a temperature of 80 °C, and the ASE intensity decreases by less than 30% under constant pumping at high fluence for 1 h. Our approach outlines that the combination of tailored surface chemistry with additional protective coating of the nanocrystal film is a feasible approach to obtain stable emission at elevated temperatures and under extended operational time scales.

中文翻译：

具有高光致发光量子产率的Al ₂ O ₃包覆的CsPbBr ₃纳米晶薄膜的高温鲁棒性

卤化钙钛矿型纳米晶体由于其高的光致发光（PL）量子产率，优异的色纯度和较低的受激发射阈值，因此在光学器件中是一种很有前途的材料。然而，一个问题是纳米晶体膜在不同环境条件下和高温下的稳定性。如果在纳米晶体膜的沉积之后需要进一步升高温度的工艺，则后者对于器件制造尤其重要。在这项工作中，我们研究了Al ₂ O ₃薄氧化层的影响纳米晶体薄膜的发光特性我们发现被季铵溴化物配体钝化的纳米晶体在涂有氧化铝的薄膜中保持其有利的光学性能，并且在高达100°C的温度下不会降解。这可以通过保留PL峰值位置和线宽，PL衰减动力学以及放大的自发发射的低阈值来体现。PL在80°C的温度下最多可保持100 h的稳定状态，并且在高通量持续1 h的恒定泵送下ASE强度降低不到30％。我们的方法概述了将量身定制的表面化学与纳米晶体膜的额外保护层结合使用是一种可行的方法，可在高温和延长的运行时间范围内获得稳定的发射。

更新日期：2020-08-28

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