Reliable Patterning, Transfer Printing and Post‐Assembly of Multiscale Adhesion‐Free Metallic Structures for Nanogap Device Applications,Advanced Functional Materials

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Reliable Patterning, Transfer Printing and Post‐Assembly of Multiscale Adhesion‐Free Metallic Structures for Nanogap Device Applications
Advanced Functional Materials ( IF 18.5 ) Pub Date : 2020-06-22 , DOI: 10.1002/adfm.202002549
Yiqin Chen ₁ , Zhiwen Shu ₂ , Zhanyong Feng ₂ , Ling’an Kong ₃ , Yuan Liu ₃ , Huigao Duan ₄

Affiliation

Patterning of metallic nanogaps with ultrasmall gap size on arbitrary substrates is of great importance for various applications in nanoelectronics, nanoplasmonics, and flexible optoelectronics. Common lithographic approaches suffer from limited resolution in defining ultrasmall nanogaps and restrictive available substrates for flexible and stretchable devices. In this work, a process portfolio to overcome the above limitations is proposed, enabling the fabrication of multiscale metallic nanogaps with reduced gap size on specific substrates for functional devices. The portfolio combines the recently developed sketch and peel lithography strategy, nanotransfer printing, and post‐mechanical assembly. Among the portfolio, the sketch and peel lithography strategy provides the unique capability to rapidly and reliably define multiscale adhesion‐free metallic nanostructures and nanogaps, which significantly facilitates the subsequent transfer printing process. Nanoplasmonic and nanoelectronic devices with ultrasmall nanogaps that are inaccessible with existing patterning approaches are fabricated to demonstrate the applicability of this fabrication strategy. The portfolio could also have potential for a variety of other applications in flexible and stretchable optics, electronics, and optoelectronics.

中文翻译：

纳米间隙器件应用的多尺度无粘金属结构的可靠图案化，转移印刷和后组装

在任意衬底上具有超小间隙尺寸的金属纳米间隙的图案化对于纳米电子学，纳米等离子体技术和柔性光电子学中的各种应用都非常重要。普通的光刻方法在定义超小纳米间隙和用于柔性和可拉伸装置的可用衬底方面有局限性。在这项工作中，提出了克服上述局限性的工艺组合，从而能够在功能性器件的特定基板上制造间隙尺寸减小的多尺度金属纳米间隙。该产品组合结合了最近开发的草图和剥离光刻技术，纳米转移印刷和机械后装配。在投资组合中，素描和剥离光刻策略提供了独特的功能，可以快速而可靠地定义无多尺度无粘附力的金属纳米结构和纳米间隙，这极大地促进了后续的转移印刷工艺。具有现有的图案化方法无法达到的具有超小纳米间隙的纳米等离子体和纳米电子器件被制造出来，以证明该制造策略的适用性。该产品组合还可能在柔性和可拉伸光学，电子和光电子领域的各种其他应用中具有潜力。具有现有的图案化方法无法访问的具有超小纳米间隙的纳米等离子体和纳米电子器件被制造出来，以证明该制造策略的适用性。该产品组合还可能在柔性和可拉伸光学，电子和光电子领域的各种其他应用中具有潜力。具有现有的图案化方法无法达到的具有超小纳米间隙的纳米等离子体和纳米电子器件被制造出来，以证明该制造策略的适用性。该产品组合还可能在柔性和可拉伸光学，电子和光电子领域的各种其他应用中具有潜力。

更新日期：2020-08-08

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