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The effect of polyhedral oligosilsesquioxanes (POSS) on cavitation resistance of hybrid acrylate films
Polymer Composites ( IF 4.8 ) Pub Date : 2020-05-16 , DOI: 10.1002/pc.25629 Mustafa Kalifa 1 , Nataša Z. Tomić 2 , Marija M. Vuksanović 3 , Sanja Stevanovic 4 , Veljko Đokić 2 , Tatjana Volkov Husović 1 , Vladimir Pavlović 5 , Radmila M. Jančić Heinemann 1 , Aleksandar D. Marinković 1
Polymer Composites ( IF 4.8 ) Pub Date : 2020-05-16 , DOI: 10.1002/pc.25629 Mustafa Kalifa 1 , Nataša Z. Tomić 2 , Marija M. Vuksanović 3 , Sanja Stevanovic 4 , Veljko Đokić 2 , Tatjana Volkov Husović 1 , Vladimir Pavlović 5 , Radmila M. Jančić Heinemann 1 , Aleksandar D. Marinković 1
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Cavitation erosion of hybrid acrylate composite films with polyhedral oligosilsesquioxanes (POSS) was investigated in this study. The hybrid films are made with 1, 3 and 5 wt% of POSS reagents containing: (a) hydroxyl (POSS‐M), (b) both hydroxyl and allyl (POSS‐M‐A) and (c) methacryloyl groups (POSS‐M‐Cl). Addition of 5 wt% POSS‐M‐A caused the highest microhardness increase for 49.8%, in comparison to the pure matrix material. Cavitation resistance of hybrid films, estimated as the time‐dependent mass loss, was improved by POSS addition. POSS‐M‐A addition (5 wt%) contributed to 94% lower mass loss comparing to pure Bis‐GMA/TEGDMA film. Scanning electron (SEM) and atomic force microscopy (AFM) showed the lowest surface roughness obtained for composite with POSS‐M‐A. The improved hardness and wear resistance of the composite films indicated that POSS‐M‐A filler enhanced interfacial adhesion and reinforcing of the Bis‐GMA/TEGDMA matrix.
中文翻译：
多面体低聚倍半硅氧烷（POSS）对混合丙烯酸酯薄膜抗空蚀性的影响
本研究研究了多面体低聚倍半硅氧烷（POSS）对混合丙烯酸酯复合薄膜的空蚀作用。杂化膜由1、3和5 wt％的POSS试剂制成，这些试剂包含：（a）羟基（POSS‐M），（b）羟基和烯丙基（POSS‐M‐A）和（c）甲基丙烯酰基（POSS） ‐M‐Cl）。与纯基质材料相比，添加5 wt％的POSS‐M‐A可使显微硬度最高增加49.8％。通过添加POSS可以改善杂化膜的抗气蚀性，估计其是随时间变化的质量损失。与纯Bis-GMA / TEGDMA薄膜相比，添加POSS‐M‐A（5 wt％）可使质量损失降低94％。扫描电子（SEM）和原子力显微镜（AFM）显示了使用POSS‐M‐A复合材料获得的最低表面粗糙度。
更新日期：2020-05-16
中文翻译：
多面体低聚倍半硅氧烷（POSS）对混合丙烯酸酯薄膜抗空蚀性的影响
本研究研究了多面体低聚倍半硅氧烷（POSS）对混合丙烯酸酯复合薄膜的空蚀作用。杂化膜由1、3和5 wt％的POSS试剂制成，这些试剂包含：（a）羟基（POSS‐M），（b）羟基和烯丙基（POSS‐M‐A）和（c）甲基丙烯酰基（POSS） ‐M‐Cl）。与纯基质材料相比，添加5 wt％的POSS‐M‐A可使显微硬度最高增加49.8％。通过添加POSS可以改善杂化膜的抗气蚀性，估计其是随时间变化的质量损失。与纯Bis-GMA / TEGDMA薄膜相比，添加POSS‐M‐A（5 wt％）可使质量损失降低94％。扫描电子（SEM）和原子力显微镜（AFM）显示了使用POSS‐M‐A复合材料获得的最低表面粗糙度。
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