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Research on cracking of SiO2 nanofilms prepared by the sol-gel method
Materials Science in Semiconductor Processing ( IF 4.2 ) Pub Date : 2019-03-01 , DOI: 10.1016/j.mssp.2018.11.022
Shasha Hao , Tao Lin , Shaohuan Ning , Yue Qi , Zejun Deng , Yonggang Wang

Abstract SiO2 nanofilms were prepared by a sol-gel method with TEOS as the precursor, ethanol as the solvent, and hydrochloric acid as the catalyst. The influences of H2O, EtOH, and HCl on the surface of SiO2 film were studied by a controlled variable method, and the effects of aging time, spin-coating speed, ammonia treatment, heat treatment, and substrate on the films were also determined experimentally. Crack-free SiO2 nanofilms with tens of microns thickness were repeatedly fabricated using the optimizing parameters, and the size of SiO2 nanoparticles was in the range of 100–500 nm.

中文翻译:

溶胶-凝胶法制备SiO2纳米薄膜的裂解研究

摘要 以TEOS为前驱体,乙醇为溶剂,盐酸为催化剂,采用溶胶-凝胶法制备了SiO2纳米薄膜。采用可控变量法研究了H2O、EtOH和HCl对SiO2薄膜表面的影响,并通过实验确定了老化时间、旋涂速度、氨处理、热处理和基材对薄膜的影响. 使用优化参数反复制备了几十微米厚的无裂纹SiO2纳米薄膜,SiO2纳米颗粒的尺寸在100-500 nm范围内。
更新日期:2019-03-01
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