Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technologies to material science. In particular, ultrafast and highly localized thermal processing of surfaces can be achieved through the sharp heated tip in t-SPL to generate high-resolution patterns. We investigate t-SPL as a means of generating three types of material interaction: removal, conversion, and addition. Each of these categories is illustrated with process parameters and application examples, as well as their respective opportunities and challenges. Our intention is to provide a knowledge base of t-SPL capabilities and current limitations and to guide nanoengineers to the best-fitting approach of t-SPL for their challenges in nanofabrication or material science. Many potential applications of nanoscale modifications with thermal probes still wait to be explored, in particular when one can utilize the inherently ultrahigh heating and cooling rates.

本文回顾了热扫描探针光刻 (t-SPL) 的基本方面和最新成果。t-SPL 是一种新兴的直接写入纳米光刻方法，具有许多独特的特性，可在从量子技术到材料科学的应用领域中实现原始或改进的纳米图案化。特别是，可以通过 t-SPL 中尖锐的加热尖端实现表面的超快和高度局部化热处理，以生成高分辨率图案。我们研究 t-SPL 作为产生三种类型材料相互作用的手段：去除、转换和添加。这些类别中的每一个都通过工艺参数和应用示例，以及它们各自的机遇和挑战进行了说明。我们的目的是提供 t-SPL 能力和当前限制的知识库，并指导纳米工程师采用 t-SPL 的最佳方法来应对他们在纳米制造或材料科学方面的挑战。使用热探针进行纳米级修饰的许多潜在应用仍有待探索，特别是当人们可以利用固有的超高加热和冷却速率时。