Imaging Beam-Sensitive Materials by Electron Microscopy.,Advanced Materials

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Imaging Beam-Sensitive Materials by Electron Microscopy.
Advanced Materials ( IF 27.4 ) Pub Date : 2020-02-28 , DOI: 10.1002/adma.201907619
Qiaoli Chen ₁ , Christian Dwyer ₂ , Guan Sheng ₃ , Chongzhi Zhu ₁ , Xiaonian Li ₁ , Changlin Zheng ₄ , Yihan Zhu ₁

Affiliation

Electron microscopy allows the extraction of multidimensional spatiotemporally correlated structural information of diverse materials down to atomic resolution, which is essential for figuring out their structure-property relationships. Unfortunately, the high-energy electrons that carry this important information can cause damage by modulating the structures of the materials. This has become a significant problem concerning the recent boost in materials science applications of a wide range of beam-sensitive materials, including metal-organic frameworks, covalent-organic frameworks, organic-inorganic hybrid materials, 2D materials, and zeolites. To this end, developing electron microscopy techniques that minimize the electron beam damage for the extraction of intrinsic structural information turns out to be a compelling but challenging need. This article provides a comprehensive review on the revolutionary strategies toward the electron microscopic imaging of beam-sensitive materials and associated materials science discoveries, based on the principles of electron-matter interaction and mechanisms of electron beam damage. Finally, perspectives and future trends in this field are put forward.

中文翻译：

通过电子显微镜对束敏感材料成像。

电子显微镜允许提取各种材料的多维时空相关结构信息，直至原子分辨率，这对于弄清它们的结构-特性关系至关重要。不幸的是，携带此重要信息的高能电子可能会通过调制材料的结构而造成损坏。对于最近在材料科学领域中广泛应用的对射线敏感的材料（包括金属-有机骨架，共价-有机骨架，有机-无机杂化材料，2D材料和沸石）的推动，这已成为一个重大问题。为此，开发出最小化电子束损伤以提取固有结构信息的电子显微镜技术是一种迫切但具有挑战性的需求。本文基于电子物质相互作用的原理和电子束损伤的机理，对电子束敏感材料的电子显微成像的革命性策略和相关材料的科学发现进行了全面的综述。最后，提出了该领域的观点和未来趋势。

更新日期：2020-04-21

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