Cu（60-80 nm）和CuO（40 nm）纳米颗粒在卤虫盐卤中的比较作用：积累，消除和氧化应激。,Science of the Total Environment

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Cu（60-80 nm）和CuO（40 nm）纳米颗粒在卤虫盐卤中的比较作用：积累，消除和氧化应激。
Science of the Total Environment ( IF 8.2 ) Pub Date : 2020-02-08 , DOI: 10.1016/j.scitotenv.2020.137230
Isil Canan Cicek Cimen ₁ , Durali Danabas ₁ , Mehmet Ates ₂

Affiliation

在这项研究中，通过将卤虫卤藻暴露于不同浓度（0.2、1、5、10、25和50）的铜（Cu 60-80 nm）和氧化铜（CuO 40 nm）纳米颗粒（NPs）中进行纳米毒性测试毫克/升）。使用透射电子显微镜（TEM），动态光散射（DLS），ζ电位，X射线衍射（XRD），扫描电子显微镜（SEM），傅立叶变换红外（FT-IR）分析对Cu和CuO NP进行表征。在生物体中，通过电感耦合等离子体质谱法（ICP-MS）确定NP的积累和消除速率，并通过谷胱甘肽（GSH）和硫代巴比妥酸反应性物质（TBARS）分析确定对盐藻的氧化应激影响。方法。发现两种NP在每次施用时的积累和消除速率均不同，并且与浓度的增加平行。在每组中，确定离子释放随施加时间增加。结果表明，在浓度分别为0、2和1 mg / l的情况下，Cu NPs的积累速率在48 h时有增加的趋势，而在72 h时有减少的趋势。在这段时间内，所有其他浓度都呈上升趋势。在CuO NPs（40 nm）中，除10 mg / l浓度外，累积速率在第48小时呈下降趋势，而在第72小时呈上升趋势。在10 mg / l组中，随着使用期限的增加趋势有所增加。Cu NP，TBARS值随浓度增加而增加，在5 ppm组的24 h观察到最大的增加。各组在经过时间（第24、48、72小时和消除）方面显示TBARS水平有增减增的趋势（5 ppm和10 ppm组在第72小时时TBARS水平有下降的趋势）。TBARS随CuO NPs（40 nm）中浓度比的增加而增加。

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Comparative effects of Cu (60-80 nm) and CuO (40 nm) nanoparticles in Artemia salina: Accumulation, elimination and oxidative stress.

In this study, nanotoxicity tests were made by exposure of Artemia salina to copper (Cu 60-80 nm) and copper oxide (CuO 40 nm) nanoparticles (NPs) at different concentrations (0.2, 1, 5, 10, 25, and 50 mg/l) during some exposure duration. Characterization of Cu and CuO NPs were performed using Transmission Electron Microscope (TEM), Dynamic Light Scattering (DLS), Zeta Potential, X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Fourier Transformation Infrared (FT-IR) analyzes. In organisms, the accumulation and elimination rates of NPs was determined by Inductively Coupled Plasma-Mass Spectrometry (ICP-MS) analysis and the oxidative stress effects on A. salina were determined by Glutathione (GSH) and Thiobarbituric acid reactive substances (TBARS) analysis methods. Both NPs were found to differ in accumulation and elimination rates at each application time and in parallel with the increase in concentration. In each group, it was determined that ion release increased with application time. The results showed that the accumulation rates in Cu NPs had a tendency to increase at 48 h and to decrease at 72 h in concentrations of 0, 2 and 1 mg/l, respectively. And in the all other concentrations have been seen an increasing trend within the time. In the CuO NPs (40 nm), accumulation rates were a decrease trend at 48th hour and an increase trend at 72nd hour except 10 mg/l concentration. In the 10 mg/l group was an increase trend with the application period. Cu NP, TBARS value increased with increasing concentrations and the highest increase was observed at 24 h of 5 ppm group. The groups showed a tendency to increase-decrease-increase-decrease in TBARS levels in terms of elapsed time (24th, 48th, 72nd hour and elimination) (5 ppm and 10 ppm groups tended to decrease in TBARS level at 72nd hour). TBARS increased with increasing concentration ratios in CuO NPs (40 nm).

更新日期：2020-02-10

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