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Direct Imprinting of Quasi-3D Nanophotonic Structures into Colloidal Quantum-Dot Devices.
Advanced Materials ( IF 27.4 ) Pub Date : 2020-01-20 , DOI: 10.1002/adma.201906590
Xin Tang 1 , Menglu Chen 1, 2 , Matthew M Ackerman 1, 3 , Christopher Melnychuk 1, 3 , Philippe Guyot-Sionnest 1, 2, 3
Affiliation  

Three-dimensional (3D) subwavelength nanostructures have emerged and triggered tremendous excitement because of their advantages over the two-dimensional (2D) counterparts in fields of plasmonics, photonic crystals, and metamaterials. However, the fabrication and integration of 3D nanophotonic structures with colloidal quantum dots (CQDs) faces several technological obstacles, as conventional lithographic and etching techniques may affect the surface chemistry of colloidal nanomaterials. Here, the direct fabrication of functional quasi-3D nanophotonic structures into CQD films is demonstrated by one-step imprinting with well-controlled precision in both vertical and lateral directions. To showcase the potential of this technique, diffraction gratings, bilayer wire-grid polarizers, and resonant metal mesh long-pass filters are imprinted on CQD films without degrading the optical and electrical properties of CQD. Furthermore, a dual-diode CQD detector into an unprecedented mid-wave infrared two-channel polarization detector is functionalized by embedding an imprinted bilayer wire-grid polarizer within the CQDs. The results show that this approach offers a feasible pathway to combine quasi-3D nanostructures with colloidal materials-based optoelectronics and access a new level of light manipulation.

中文翻译:

将准3D纳米光子结构直接压印到胶体量子点器件中。

三维(3D)亚波长纳米结构已经出现,并引起了极大的兴奋,因为它们在等离子,光子晶体和超材料领域比二维(2D)对应物更具优势。然而,由于常规的光刻和蚀刻技术可能会影响胶体纳米材料的表面化学性质,因此将3D纳米光子结构与胶体量子点(CQDs)的制造和集成面临若干技术障碍。在这里,功能性准3D纳米光子结构直接制造为CQD薄膜的过程,是通过在垂直和横向两个方向上以良好控制的精确度一步印制而成的。为了展示这种技术的潜力,衍射光栅,双层线栅偏振器,并在CQD膜上压印了谐振金属网状长通滤光片,而不会降低CQD的光学和电学性能。此外,通过将压印的双层线栅偏振器嵌入到CQD中,可以使双二极管CQD检测器变成前所未有的中波红外两通道偏振检测器。结果表明,该方法为将准3D纳米结构与基于胶体材料的光电子学结合并获得新的光控制水平提供了可行的途径。
更新日期:2020-03-03
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