Use of photodegradable inhibitors in UV‐curable compositions to form polymeric 2D‐structures by visible light,Journal of Applied Polymer Science

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Use of photodegradable inhibitors in UV‐curable compositions to form polymeric 2D‐structures by visible light
Journal of Applied Polymer Science ( IF 2.7 ) Pub Date : 2020-01-15 , DOI: 10.1002/app.48976
Sergey Nickolayevich Mensov _{1,

2} , Gleb A. Abakumov _{1,

2} , Maxim V. Arsenyev _{1,

2} , Maxim A. Baten'kin ₁ , Sergey A. Chesnokov ₁ , Alexey N. Konev ₁ , Yuri V. Polushtaytsev ₁ , Margarita P. Shurygina ₁ , Maria Yu. Zakharina ₁

Affiliation

The process of two‐wave photopolymerization of a UV‐curable composition with an optically degrading inhibitor is considered. By numerical simulation, it is shown that in the composition layer uniformly exposed to UV‐radiation, such systems allow getting segments with different conversion under the action of inhomogeneous visible light. Based on the data on the photopolymerization kinetics of the compositions from triethylene glycol dimethacrylate (TEGDMA) and bis phenol‐A glycidyl dimethacrylate (bis ‐GMA) with the UV‐initiator 2,2‐dimethoxy‐2‐phenylacetophenone (DMPA), it was shown that 3,5‐di‐tert ‐butyl‐o ‐benzoquinone (35Q) with N ,N ‐dimethylaniline (DMA, “Aldrich”, 99%) can serve as an inhibitor that degrades under action of visible radiation. Combining inhomogeneous visible light generated with a conventional DLP‐projector and uniform UV‐radiation of LED (365 nm) the two‐wave lithographic process was implemented to create polymeric 2D‐structures in 20 μm layer of the compositions from TEGDMA (70)/bis ‐GMA (30)/DMPA (0.05 wt%)/35Q (0.5 wt%)/DMA (1 wt%).

中文翻译：

在紫外光固化组合物中使用光降解抑制剂，通过可见光形成聚合物二维结构

考虑了用光降解抑制剂对紫外线固化组合物进行两次波光聚合的过程。通过数值模拟表明，在均匀暴露于紫外线辐射的组成层中，此类系统允许在不均匀可见光的作用下获得具有不同转化率的链段。基于在所述组合物的光聚合动力学数据从三乙二醇二甲基丙烯酸酯（TEGDMA）和双苯酚-A缩水甘油基二甲基丙烯酸酯（双-GMA）与UV引发剂2,2-二甲氧基-2-苯基苯乙酮（DMPA），它是表明3,5-二-叔丁基- ø苯醌（35Q）与ñ，ñ‐二甲基苯胺（DMA，“ Aldrich”，99％）可以用作在可见光辐射作用下降解的抑制剂。将传统DLP投影仪产生的不均匀可见光与LED的均匀UV辐射（365 nm）结合起来，实施了两波光刻工艺，以在20μm的TEGDMA（70）/ bis组合物中形成聚合物2D结构。‐GMA（30）/ DMPA（0.05 wt％）/ 35Q（0.5 wt％）/ DMA（1 wt％）。

更新日期：2020-01-15

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