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Epitaxial growth and metallicity of rutile MoO2 thin film
RSC Advances ( IF 3.9 ) Pub Date : 2016-06-17 00:00:00 , DOI: 10.1039/c6ra09928a
EunYoung Ahn 1, 2, 3, 4 , Yu-Seong Seo 1, 4, 5, 6 , JinHyung Cho 2, 3, 4, 7 , Inwon Lee 2, 3, 4, 8 , Jungseek Hwang 1, 4, 5, 6 , Hyoungjeen Jeen 1, 2, 3, 4
Affiliation  

Molybdenum oxides have various crystal structures and physical properties due to the multiple valence states of the 4d molybdenum. Among them, MoO2 has a distorted rutile structure with chemical stability and metallic behavior. In this study we grew epitaxial (100) MoO2 thin films on (0001) Al2O3 substrates. Through careful control of the Ar-partial pressure and growth temperature, we determined the optimal growth condition. From our structural assessments, MoO2 epitaxial thin films with high crystallinity can only be achieved in very narrow growth conditions such as 500 °C and 7 mTorr. The thin film prepared under optimal condition showed good metallic behavior, which was confirmed by electronic transport and optical reflectance measurements. A detailed electronic structure was also investigated by spectroscopic ellipsometry.

中文翻译:

金红石型MoO 2薄膜的 外延生长和金属化

由于4d钼的多价态,氧化钼具有各种晶体结构和物理性质。其中,MoO 2具有扭曲的金红石结构,具有化学稳定性和金属行为。在这项研究中,我们在(0001)Al 2 O 3衬底上生长了外延(100)MoO 2薄膜。通过仔细控制Ar分压和生长温度,我们确定了最佳生长条件。根据我们的结构评估,MoO 2只有在非常狭窄的生长条件下(例如500°C和7 mTorr)才能获得具有高结晶度的外延薄膜。在最佳条件下制备的薄膜表现出良好的金属性能,这通过电子传输和光反射率测量得到证实。还通过椭圆偏振光谱法研究了详细的电子结构。
更新日期:2016-06-17
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