Dimethoxydimethylsilane (DODSi) is used as an interface stabilizing additive through a selective HF scavenging reaction for layered Ni‐rich oxide cathodes. Ex situ NMR analyses demonstrated that DODSi effectively removes HF from the electrolyte based on the matched chemical reactivity of Si with F⁻ and O with H⁺. The cells employing DODSi exhibit higher specific capacity with retention than those cycled with a DODSi‐free electrolyte even under in situ HF generating conditions. Scanning electron microscopy (SEM), X‐ray photoelectron spectroscopy (XPS), and inductively coupled plasma‐mass spectroscopy (ICP‐MS) analyses indicate that DODSi effectively protects the Ni‐rich oxide cathodes against HF corrosion, resulting in improved surface stability of Ni‐rich cathodes.

中文翻译：

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甲硅烷基硅烷基化的二甲氧基二甲基硅烷对富镍NCM阴极电化学性能的影响。

二甲氧基二甲基硅烷（DODSi）通过针对层状富镍氧化物阴极的选择性HF清除反应用作界面稳定添加剂。易地NMR分析表明，DODSi有效地从基于以F Si的匹配化学反应的电解质除去HF ^-和O用H ⁺。与使用不含DODSi的电解液循环的电池相比，使用DODSi的电池即使在原位产生HF的条件下仍具有更高的比容量和保留率。扫描电子显微镜（SEM），X射线光电子能谱（XPS）和电感耦合等离子体质谱（ICP-MS）分析表明，DODSi有效地保护了富镍的氧化阴极免受HF腐蚀，从而提高了表面稳定性富镍阴极。