当前位置: X-MOL首页SCI期刊查询及投稿分析系统 › Advanced Electronic Materials杂志
Advanced Electronic Materials
基本信息
期刊名称 Advanced Electronic Materials
ADV ELECTRON MATER
期刊ISSN 2199-160X
期刊官方网站 https://onlinelibrary.wiley.com/journal/2199160x
是否OA Yes
出版商 Wiley-VCH Verlag
出版周期
文章处理费 登录后查看
始发年份
年文章数 389
影响因子 5.3(2023)  scijournal影响因子  greensci影响因子
中科院SCI期刊分区
大类学科 小类学科 Top 综述
工程技术2区 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合2区
NANOSCIENCE & NANOTECHNOLOGY 纳米科技3区
PHYSICS, APPLIED 物理:应用2区
CiteScore
CiteScore排名 CiteScore SJR SNIP
学科 排名 百分位 11.0 1.689 1.154
Materials Science
Electronic, Optical and Magnetic Materials
36/284 87%
补充信息
自引率 1.9%
H-index 33
SCI收录状况 Science Citation Index Expanded
官方审稿时间 登录后查看
网友分享审稿时间 数据统计中,敬请期待。
接受率 登录后查看
PubMed Central (PMC) http://www.ncbi.nlm.nih.gov/nlmcatalog?term=2199-160X%5BISSN%5D
投稿指南
期刊投稿网址 https://www.editorialmanager.com/ADVELECTRONICMAT
收稿范围
Advanced Electronic Materials is an interdisciplinary forum for peer-reviewed, high-quality, high-impact research in the fields of materials science, physics, and engineering of electronic and magnetic materials. It includes research on physics and physical properties of electronic and magnetic materials, spintronics, electronics, device physics and engineering, micro- and nano-electromechanical systems, and organic electronics, in addition to fundamental research.
收录体裁
Communications
Full Papers
Reviews
Progress Reports
Research News
Essays
Correspondences
投稿指南 https://onlinelibrary.wiley.com/page/journal/2199160x/homepage/author-guidelines
投稿模板 https://onlinelibrary.wiley.com/page/journal/2199160x/homepage/2707_authorresources.html
参考文献格式
编辑信息

Sang-Woo Kim, Sungkyunkwan University, Seoul, Republic of Korea

       Stuart Parkin, MPI Halle, Germany

       Xiaohui Qiu, National Center for Nanoscience and Technology, Beijing, China

       John Rogers, Northwestern University, Evanston, IL, USA

       Henning Sirringhaus, University of Cambridge, UK

       Takao Someya, University of Tokyo, Japan

       Rainer Waser, RWTH Aachen University, Germany

International Advisory Board:

 

       Jong Hyun Ahn, Yonsei University, Seoul, Republic of Korea

       Marin Alexe, University of Warwick, UK

       Hiroshi Amano, Nagoya University, Japan

       Phaedon Avouris, IBM, New York, USA

       David Barbero, Umea University, Sweden

       Zhenan Bao, Stanford University, USA

       Mark Blamire, University of Cambridge, UK

       Paul Blom, University of Mainz, Germany

       Karl Böhringer, University of Washington, Seattle, USA

       Lapo Bogani, Oxford University, UK

       Ivan Bozovic, Brookhaven National Laboratory, Upton, USA

       Alexander Balandin, University Of California Riverside, USA

       David Cahill, University of Illinois at Urbana-Champaign, USA

       Guozhong Cao, University of Washington, Seattle, USA

       Hui-Ming Cheng, Shenyang National Laboratory, China

       Kilwon Cho, Pohang University of Science and Technology, Korea

       Eugenio Coronado, Universitat de València, Spain

       Xiangfeng Duan, University of California Los Angeles, USA

       Bruce Dunn, University of California Los Angeles, USA

       Josep Fontcuberta, Institute of Materials Science of Barcelona, Spain

       Gregory Fuchs, Cornell University, Ithaca, USA

       Yuri Gogotsi, Drexel University, Philadelphia, USA

       Marius Grundmann, University of Leipzig, Germany

       Yunlong Guo, Institute of Chemistry, CAS, Beijing, China

       Hideo Hosono, Tokyo Institute of Technology, Japan

       Wenping Hu, Institute of Chemistry, Chinese Academy of Science, Beijing, China

       Wei Huang, Nanjing University of Technology, China

       Cheol-Seong Hwang, Seoul National University, Republic of Korea

       Nazir Kherani, University of Toronto, Canada

       Jang-Joo Kim, Seoul National University, Republic of Korea

       Hagen Klauk, Max Plank Institute for Solid State Research, Stuttgart, Germany

       Holger Kleinke, University of Waterloo, Canada

       Valeri Kotov, University of Vermont, Burlington, USA

       Yoshihiro Kubozono, Okayama University, Japan

       Mario Lanza, Institute of Functional Nano & Soft Materials, Suzhou, China

       Takhee Lee, Seoul National University, Republic of Korea

       Qingwen Li, Suzhou Institute of Nanoscience and Nanobionics, China

       Yongfang Li, Institute of Chemistry, Chinese Academy of Science, Beijing, China

       Emil List, NanoTec Center Weiz, Austria

       Ming Liu, Institute of Microelectronics, Chinese Academy of Science, Beijing, China

       Maria Antonietta Loi, University of Groningen, the Netherlands

       Xiong Wen Lou, Nanyang Technological University, Singapore

       Cristine Luscombe, University of Washington, Seattle, USA

       Liqiang Mai, Wuhan University of Technology, China

       Rodrigo Martins, Universidade Nova de Lisboa, Portugal

       Richard McCullough, Harvard University, Cambridge, USA

       Martyn McLachlan, Imperial College London, UK

       Neil Mathur, University of Cambridge, UK

       Andy Monkman, Durham University, UK

       Hadis Morkoc, Virginia Commonwealth University, Richmond, USA

       Yoshio Nishi, Stanford University, USA

       Tae Won Noh, Seoul National University, Republic of Korea

       Qibing Pei, University of California Los Angeles, USA

       Clive Randall, Pennsylvania State University, USA

       Alberto Salleo, Stanford University, USA

       James Scott, University of St. Andrews, UK

       Jan Seidel, University of New South Wales, Sydney, Australia

       Jeffrey Snyder, Northwestern University, Illinois, USA

       Susanne Stemmer, University of California Santa Barbara, USA

       Michael Strano, Massachusetts Institute of Technology, Cambridge, USA

       Osamu Tabata, Kyoto University, Japan

       He Tian, East China University of Science and Technology, Shanghai, China

       Joseph Wang, University of California San Diego, USA

       Christian Wetzel, Rensselaer Polytechnic Institute, Troy, USA

       Peter Woias, University of Freiburg, Germany

       H.-S. Philip Wong, Stanford University, USA

       Matthias Wuttig, RWTH Aachen University, Germany

       Gary Fedder, Carnegie Mellon University, Pittsburgh, USA

       Ulrike Wallrabe, University of Freiburg, Germany

       Xudong Wang, University of Wisconsin-Madison, USA

我要分享  (欢迎您来完善期刊的资料,分享您的实际投稿经验)
研究领域:
投稿录用情况: 审稿时间:  个月返回审稿结果
本次投稿点评:
提交
down
wechat
bug