Advanced Materials Interfaces publishes applied, top-level research on functional interfaces and surfaces and their specific applications, driving forward our understanding of interfacial processes. Considering that interfaces between solids, liquids, and gases play an essential role in virtually all materials and devices, the journal’s scope encourages an interdisciplinary blend of physics, chemistry, materials science, and life sciences, including:

Applications of functional interfaces and surfaces
Applications of 2D materials and heterostructures
Surfaces and interfaces in optoelectronic devices
Catalysis and membranes
Applications of self-assembled and nanopatterned surfaces and interfaces
Applications of composite and coating materials
Biointerfaces and interactions of cells with surfaces
Functional surfaces for biotechnological and medical applications
Advanced Materials Interfaces was launched in 2014. It welcomes all topics in applied surface and interface-related research in a wide choice of formats: Research Articles, Reviews, Perspectives, and Comments.

Communications
Full Papers
Reviews
Progress Reports
Essays
Correspondences

Executive Advisory Board:
 
      Hans M. Christen, ORNL
       Harald Fuchs, University of Münster
       Karen K. Gleason, MIT
       Bartosz A. Grzybowski, Northwestern University
       Lei Jiang, CAS Beijing
       Alexander Shluger, UCL
Advisory Board:
 
        Raymond Adomaitis, UMERC
       Ariando, NUS
      Charles Ahn, Yale University
       Robert W. Carpick, University of Pennsylvania
       Lifeng Chi, FUNSOM Institute, Soochow University
       Paul K. Chu, City University of Hong Kong
       Anjana Devi, Ruhr-University Bochum
       Georg Duesberg, Trinity College Dublin
       Mats Fahlman, Linköping University
       Hongjin Fan, NTU
       Jinlong Gong, Tianjin University
       Michael Hitchman, University of Strathclyde
       Gary Hodes, Weizmann Institute
       Rene A. J. Janssen, TU Eindhoven
       Antoine Kahn, Princeton University
       Mikhail Katsnelson, Radboud University, Nijmegen
       David Kisailus, UC Riverside
       Mato Knez, nanoGUNE
       Sander Leeuwenburgh, Radboud University, Nijmegen
       Maria Antonietta Loi, University of Groningen
       Graziella Malandrino, Universitá Degli Studi di Catania
       Francis Maury, CIRIMAT
       Gianfranco Pacchioni, University of Milano-Bicocca
       Jeong Young Park, SCALE Laboratory, KAIST
       Martyn Pemble, University College Cork
       Hailin Peng, Peking University
       Karsten Reuter, TU München
       Mikko Ritala, University of Helsinki
       Jennifer Rupp, Massachusetts Institute of Technology
       Udo Schwingenschlögl, KAUST
       Yukihiro Shimogaki, University of Tokyo
       Taolei Sun, Wuhan University of Technology
       Dan Wang, Institute of Process Engineering, Chinese Academy of Sciences
       Jianjun Wang, Institute of Chemistry, Chinese Academy of Sciences
       Christof Wöll, KIT
       Han Woong Yeom, POSTECH
       Aleksander M. Wrobel, Polish Academy of Sciences
       Kai Wu, Peking University
       Jimmy Yu, The Chinese University of Hong Kong
       Han Zuilhof, Wageningen UR
       Qiang Zhang, Tsinghua University
       Nanfeng Zheng, Xiamen University