Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

Editors:
Anthony B. Murphy 
CSIRO Manufacturing
Sydney NSW, Australia
Bruce R. Locke
Department of Chemical and Biomedical Engineering, FAMU-FSU College of Engineering
Florida State University
Tallahassee, Florida, USA
Founding Editors:

Emil Pfender
Department of Mechanical Engineering, University of Minnesota
Minneapolis, Minnesota, USA

Stan Veprek
Department of Chemistry, Technical University Munich
Garching, Germany
Editorial Board:

J. P. Badyal, University of Durham, Durham, England; A. Bogaerts, University of Antwerp, Antwerp, Belgium; M. Boulos, University of Sherbrooke, QC, Canada; P. Bruggeman,University of Minnesota, Minnesota, USA; M. Capitelli, University of Bari, Bari, Italy; S. Coulombe, McGill University, Montreal, Canada; P. Fauchais, University of Limoges, Limoges, France; S. Girshick,University of Minnesota, Minnesota, USA; D. B. Graves,University of California, Berkeley, USA; D. Hegemann, EMPA, Swiss Federal Laboratories for Materials Science and Technology, St. Gallen, Switzerland; M. Hrabovsky, Academy of Sciences of the Czech Republic, Prague, Czech Republic; M. Kong, Old Dominion University, Norfolk, Virginia, USA; D. Loffhagen, Leibniz Institute for Plasma Science and Technology, Greifswald, Germany; S. Mededovic Thagard, Clarkson University, Potsdam, NY, USA.; R. Morent, Ghent University, Ghent, Belgium; J. Mostaghimi, University of Toronto, Toronto, Canada; T. Nozaki, Tokyo Institute of Technology, Tokyo, Japan; M. Sankaran, Case Western Reserve University, Cleveland, OH, USA; A. Vardelle, Universite de Limoges, Limoges, France; J. C. Whitehead, University of Manchester, Manchester, England.