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Journal of Vacuum Science & Technology A
基本信息
期刊名称 Journal of Vacuum Science & Technology A
J VAC SCI TECHNOL A
期刊ISSN 0734-2101
期刊官方网站 http://avspublications.org/jvsta/
是否OA No
出版商 AVS Science and Technology Society
出版周期 Bimonthly
文章处理费 登录后查看
始发年份
年文章数 333
影响因子 2.4(2023)  scijournal影响因子  greensci影响因子
中科院SCI期刊分区
大类学科 小类学科 Top 综述
工程技术4区 MATERIALS SCIENCE, COATINGS & FILMS 材料科学:膜4区
PHYSICS, APPLIED 物理:应用4区
CiteScore
CiteScore排名 CiteScore SJR SNIP
学科 排名 百分位 5.1 0.569 0.957
Physics and Astronomy
Condensed Matter Physics
135/434 69%
Physics and Astronomy
Surfaces and Interfaces
19/57 67%
Materials Science
Surfaces, Coatings and Films
45/132 66%
补充信息
自引率 12.5%
H-index 100
SCI收录状况 Science Citation Index Expanded
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PubMed Central (PMC) http://www.ncbi.nlm.nih.gov/nlmcatalog?term=0734-2101%5BISSN%5D
投稿指南
期刊投稿网址 http://jvsta.peerx-press.org/cgi-bin/main.plex
收稿范围
JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics:

Applied and fundamental surface science
Atomic layer deposition and atomic layer etching
Electronic and photonic materials and their processing, including 2D materials
Magnetic thin films and interfaces
Materials and thin films for energy conversion and storage
Photovoltaics, including thin film solar cells and organic and hybrid solar cells
Plasma science and technology, including plasma-surface interactions, plasma diagnostics, plasma deposition and etching, and applications of plasmas to micro and nanoelectronics
Surface coatings and engineering
Thin film deposition, including physical and chemical vapor deposition and molecular beam epitaxy
Thin film properties and characterization
Transmission electron microscopy, including in situ methods
Tribology
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编辑信息

JVST Editorial Board
Steven L. Bernasek, Princeton University
Yves J. Chabal, University of Texas at Dallas
Vincent M. Donnelly, University of Houston
Alfred Grill, IBM T.J. Watson Research Center
Sarah R. Kurtz, National Renewable Energy Laboratory
Tadatsugu Minami, Kanazawa Institute of Technology
Stephen J. Pearton, University of Florida
R. Ramesh, Univ. of California at Berkeley
Jack Rowe, North Carolina State University
Ellen D. Williams, University of Maryland
Richard van de Sanden, Eindhoven University of Technology
Mikhail Zharnikov, Universität Heidelberg

AVS Publications Committee 
Chair: Ivan Petrov, University of Illinois at Urbana-Champaign
Vice Chair: Charles R. “Chip” Eddy, Jr., Naval Research Laboratory 
Gregory J. Exarhos, Pacific Northwest National Laboratory 
Lara Gamble, University of Washington
Jay Hendricks, NIST 
Jane P. Chang, University of California, Los Angeles

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