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Editor-in-Chief J.M. FeliuDepto. de Quimica Fisica, Universidad de Alicante, Alicante, SpainEditors M. OpalloInst. of Physical Chemistry, Dept. of Electrode Processes, Polish Academy of Sciences, 44/52 Kasprzaka, 01-224, Warsaw, Poland Email M. OpalloR. TorresiInstituto de Química, Departamento de Química Fundamental, Universidade de São Paulo (USP), CEP 05513-970, Sao Paulo, Brazil Email R. TorresiX.-H. XiaSchool of Chemistry and Chemical Engineering, Nanjing University, Xianlin Ave 163, 210023, Nanjing, China Email X.-H. XiaHonorary Editor R. Parsons†Southampton, UKHonorary Board H.D. AbruñaIthaca, New York, USAC.H. AmatoreParis, FranceF. AnsonPasadena, California, USAW.R. FawcettDavis, California, USAH.H. GiraultLausanne, SwitzerlandJ. LipkowskiGuelph, CanadaL.M. PeterClaverton Down, Bath, England, UKJ.M. SavéantParis, FranceEditorial Board D.W.M. ArriganPerth, AustraliaS. Cordoba de TorresiSao Paulo, BrazilA. CuestaAberdeen, Scotland, UKD.H. EvansWest Lafayette, Indiana, USAR. GuidelliFirenze, ItalyDaegu, The Republic of Korea C. KorzeniewskiLubbock, Texas, USAK. KrischerGarching, GermanyF. MarkenClaverton Down, Bath, England, UKA. MolinaEspinardo, Murcia, SpainM. Oliveira Fonseca GoulartMaceio-L, BrazilF. PaolucciBologna, ItalyL. RassaeiDelft, NetherlandsZ. SamecPrague, Czech RepublicE.D.R. Santibanez GonzalezPorto Seguro, BrazilD.J. SchiffrinLiverpool, UKW. SchmicklerUlm, GermanyG. TsirlinaMoscow, Russian FederationI. WillnerJerusalem, Israel
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