Editors Rajiv Asthana, Editor, University of Wisconsin-Stout, Menomonie, WI, USA Associate Editors Elvin Beach, Associate Editor, The Ohio State University, Columbus, OH, USA Omar S. Es-Said, Associate Editor, Loyola Marymount University, Los Angeles, CA, USA William E. Frazier, Associate Editor, Pilgrim Consulting, LLC, Lusby, MD, USA Sergiy Kalnaus, Associate Editor, Oak Ridge National Laboratory, Oak Ridge, TN, USA P.R. Subramanian, Associate Editor, General Electric, Niskayuna, NY, USA Jeffery Waldman, Associate Editor, NAVMAR Applied Sciences Corporation, Warminster, PA, USA Editorial Committee Tatsuki Ohji, Chair, AIST, Japan; Dileep Singh, Vice Chair, Argonne National Laboratories, Argonne, IL, USA; Francisco Sola, Secretary, NASA, Cleveland, OH, USA; Hua-Tay Lin, Immediate Past Chair, Guangdong University, Guangzhou, China; Bandar AlMangour, SABIC, Dammam Eastern Providence, Saudi Arabia; Antonello Astarita, University of Naples Federico II, Naples, Italy; Pierpaolo Carlone, University of Salerno, Fisciano, Italy; Daolun Chen, Ryerson University, Toronto, ON, Canada; Fei Chen, Wuhan University of Technology, Wuhan, Hubei, China; Gaoqiang Chen, Tsinghua University, Beijing, China; Kester Clarke, Colorado School of Mines, Golden, CO, USA; Timothy P. Gabb, NASA Glenn Research Center, Cleveland, OH, USA; Surojit Gupta, University of North Dakota, Grand Forks, ND, USA; Sivaraman Guruswamy, University of Utah, Salt Lake City, UT, USA; Andrew Gyekenyesi, Ohio Aerospace Institute, Cleveland, OH, USA; Carter Hamilton, Miami University, Oxford, OH, USA; Jeffrey A. Hawk, National Energy Technology Laboratory, Albany, OR, USA; Ibrahim Karaman, Texas A&M University, College Station, TX, USA; Y.C. Lin, Central South University, Changsha, China;Yellapu Murty, MC Technologies LLC, Charlottesville, VA, USA; Thomas Niendorf, University of Kassel, Kassel, Germany; Todd Palmer, Pennsylvania State University, State College, PA, USA; S.V. Raj, NASA, Cleveland, OH, USA;T. S. Srivatsan, The University of Akron, Akron, OH, USA; John M. Tartaglia, Element Materials Technology, Wixom, MI, USA; Jingyang Wang, Institute of Material Research, Shenyang, China; Gerhard Welsch, Case Western Reserve University, Cleveland, OH, USA; Hao Zhang, The Boeing Company, Portland, OR, USA; Rajiv Asthana, ex-officio member, University of Wisconsin-Stout, Menomonie, WI, USA; Elvin Beach, ex-officio member, The Ohio State University, Columbus, OH, USA;Omar S. Es-Said, ex-officio member, Loyola Marymount University, Los Angeles, CA, USA; William E. Frazier, ex-officio member, Pilgrim Consulting, LLC, Lusby, MD, USA; Sergiy Kalnaus, ex-officio member, Oak Ridge National Laboratory, Oak Ridge, TN, USA; P.R. Subramanian, ex-officio member, General Electric, Niskayuna, NY, USA; Jeffery Waldman, ex-officio member, NAVMAR Applied Sciences Corporation, Warminster, PA, USA; Mary Anne Fleming, Staff Liaison, ASM International,Materials Park, OH, USA; Scott Henry, Staff Associate, ASM International, Materials Park, OH, USA;
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