期刊论文

[12] C. Wu, X. Zhao, Q. Wang, H. Zhang*, P. Bai, Domain epitaxial matching of γ-CuI film grown on Al₂O₃(001) substrate via physical vapor transport, APL Mater. 12, (2024). 

[11] J. Liu, H. Deng, X. Zhao, C. Wu, H. Zhang*, F. Lang, Investigation of the nano and micromechanical performance of β-Ga₂O₃ epitaxial films on sapphire using nanoindentation, Vacuum. 227 (2024) 113413. 

[10] X. Zhang, X. Zhu, X. Zhao, H. Zhang*, W. Chen, Understanding the Thermodynamics of Si and Ge Concentration Variation in SiGeSn Nanowires, Phys. Status Solidi. (A), 221(23), 2400261( 1–8), (2024).

[9] K. Zhang, L. Feng, L. Wang, J. Zhu, H. Zhang, S. Ha, J. Sun, H. Liang, T. Yang, Ga₂O₃/Ag/Ga₂O₃-Laminated Film Fabricated at Room Temperature: Toward Applications in Ultraviolet Transparent Highly Conductive Electrodes, Crystals. 13 (2023) 1018. 18.

[8] J. Zhu, Z. Xu, S. Ha, D. Li, K. Zhang, H. Zhang*, J. Feng, Gallium Oxide for Gas Sensor Applications: A Comprehensive Review, Materials (Basel). 15 (2022) 7339. 

[7] J. WU, K. MAKIHARA, H. ZHANG*, N. TAOKA, A. OHTA, S. MIYAZAKI, Magnetic-Field Dependent Electron Transport of Fe₃Si Nanodots, IEICE Trans. Electron. E105.C (2022) 2021FUP0007. 

[6] J. Wu, H. Zhang, H. Furuhata, K. Makihara, M. Ikeda, A. Ohta, S. Miyazaki, Characterization of Magnetic-Field Dependent Electron Transport of  Fe3Si Nanodots by Using a Magnetic AFM Probe, ECS Trans. 98 (2020) 493–498. 

[5] H. Zhang, K. Makihara, M. Ikeda, A. Ohta, S. Miyazaki, High Density Formation and Magnetoelectronic Transport Properties of Fe₃Si Nanodots, ECS Trans. 86 (2018) 131–138. 

[4] H. Zhang, K. Makihara, A. Ohta, M. Ikeda, S. Miyazaki, Formation and characterization of high-density FeSi nanodots on SiO₂ induced by remote H₂ plasma, Jpn. J. Appl. Phys. 55 (2016) 01AE20. 

[3] R. Fukuoka, K. Makihara, H. Zhang, A. Ohta, T. Kato, S. Iwata, M. Ikeda, S. Miyazaki, High Density Formation of FePt Alloy Nanodots Induced by Remote Hydrogen Plasma and Characterization of their Magnetic Properties, Trans. Mater. Res. Soc. Japan. 40 (2015) 347–350. 

[2] A. Ohta, C. Liu, T. Arai, D. Takeuchi, H. Zhang, K. Makihara, S. Miyazaki, Resistance-switching characteristics of Si-rich oxide evaluated by using Ni nanodots as electrodes in conductive AFM measurements, IEICE Trans. Electron. E98C (2015) 406–410. 

[1] H. Zhang, R. Fukuoka, Y. Kabeya, K. Makihara, S. Miyazaki, High density formation of iron nanodots on SiO₂ induced by remote hydrogen plasma, Adv. Mater. Res. 750–752 (2013) 1011–1015. 

专利：

化学气相沉积管式炉管, 吴春钦，张海， 李铭，胡明丹，庞勍, 2022-2-24, 中国，专利号：ZL202122624067.0

氧化镓异质外延薄膜的制备方法，张海，牛鼎元，赵学平，崔晓明，杨俊彪，刘全龙，2024年12月06日, 中国， 专利号：ZL 202411354861.X