The NanoFrazor Scholar is used for nano-patterning in various application areas, such as quantum devices, 1D/2D materials like quantum dots, Dolan bridges, and Josephson junctions, and nanoscale arrays. The unique capabilities of the NanoFrazor Scholar enable novel research in both new devices and new materials. For example, Thermal Scanning Probe Lithography (t-SPL) can be used in advanced applications such as grayscale photonics devices, nanofluidic structures, or biomimetic substrates for cell growth, or any application requiring local modification of materials via heat, e.g., chemical reactions and physical phase changes.

In-situ imaging enables two unique features: markerless overlay and comparison of the written and target patterns during writing in such a way that the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-3 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible with other techniques.