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Photopolymerization of Coumarin-Containing Reversible Photoresponsive Materials Based on Wavelength Selectivity
Industrial & Engineering Chemistry Research ( IF 3.8 ) Pub Date : 2019-02-15 , DOI: 10.1021/acs.iecr.8b05164 Qiang Chen 1 , Qian Yang 1 , Pei Gao 1 , Baihong Chi 2 , Jun Nie 1 , Yong He 1
Industrial & Engineering Chemistry Research ( IF 3.8 ) Pub Date : 2019-02-15 , DOI: 10.1021/acs.iecr.8b05164 Qiang Chen 1 , Qian Yang 1 , Pei Gao 1 , Baihong Chi 2 , Jun Nie 1 , Yong He 1
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The photoresponse of the coumarin derivative based on reversible photodimerization and photocleavage has been studied for a long time. This paper reports a novel approach of preparing photoresponsive polymer materials containing coumarin structure by photopolymerization based on the wavelength selectivity. A photopolymerizable and photoresponsive monomer, 7-(hydroxyethoxy)-4-methyl-coumarin (AECM), was synthesized, and photopolymerization was performed on it using UV light irradiation (λ = 405 nm). After polymerization the polymer with coumarin pendant groups can achieve reversible photo-induced [2 + 2] dimerization under UV light (λ > 300 nm) and photocleavage of the cross-link to recovery back to the original structure through further irradiation with UV light (λ = 254 nm). What’s more, this monomer could be used to produce a high-resolution pattern and photo-responsive pressure sensitive adhesive through photopolymerization. The demonstrated approach opens new perspectives for the design of photoresponse materials.
中文翻译：
基于波长选择性的含香豆素可逆光响应材料的光聚合
长期以来研究了基于可逆光二聚化和光裂解的香豆素衍生物的光响应。本文报道了一种基于波长选择性通过光聚合制备包含香豆素结构的光敏聚合物材料的新方法。合成了光聚合性和光响应性单体7-（羟基乙氧基）-4-甲基香豆素（AECM），并使用紫外线（λ＝ 405nm）对其进行光聚合。聚合后，带有香豆素侧基的聚合物可以在紫外光（λ> 300 nm）下实现可逆的光诱导[2 + 2]二聚化，并且通过进一步用紫外光照射，交联剂的光裂解可以恢复到原始结构（ λ= 254 nm）。更重要的是，该单体可用于通过光聚合反应生产高分辨率图案和光敏压敏胶。演示的方法为光响应材料的设计开辟了新的视角。
更新日期：2019-02-15
中文翻译：
基于波长选择性的含香豆素可逆光响应材料的光聚合
长期以来研究了基于可逆光二聚化和光裂解的香豆素衍生物的光响应。本文报道了一种基于波长选择性通过光聚合制备包含香豆素结构的光敏聚合物材料的新方法。合成了光聚合性和光响应性单体7-（羟基乙氧基）-4-甲基香豆素（AECM），并使用紫外线（λ＝ 405nm）对其进行光聚合。聚合后，带有香豆素侧基的聚合物可以在紫外光（λ> 300 nm）下实现可逆的光诱导[2 + 2]二聚化，并且通过进一步用紫外光照射，交联剂的光裂解可以恢复到原始结构（ λ= 254 nm）。更重要的是，该单体可用于通过光聚合反应生产高分辨率图案和光敏压敏胶。演示的方法为光响应材料的设计开辟了新的视角。
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