Directed Self‐Assembly of Poly(2‐vinylpyridine)‐b‐polystyrene‐b‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template,Advanced Materials

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Directed Self‐Assembly of Poly(2‐vinylpyridine)‐b‐polystyrene‐b‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template
Advanced Materials ( IF 27.4 ) Pub Date : 2015-06-18 , DOI: 10.1002/adma.201501585
Zhiwei Sun ₁ , Zhenbin Chen ₂ , Wenxu Zhang ₁ , Jaewon Choi ₁ , Caili Huang ₁ , Gajin Jeong ₁ , E. Bryan Coughlin ₁ , Yautzong Hsu ₃ , XiaoMin Yang ₃ , Kim Y. Lee ₃ , David S. Kuo ₃ , Shuaigang Xiao ₃ , Thomas P. Russell ₁

Affiliation

Low molecular weight P2VP‐b‐PS‐b‐P2VP triblock copolymer (poly(2‐vinlypyridine)‐block‐polystyrene‐block‐poly(2‐vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt‐doped P2VP‐b‐PS‐b‐P2VP triblock copolymer is self‐assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long‐range ordering are prepared with platinum‐salt infiltration and plasma etching.

中文翻译：

使用纳米压印光刻胶模板以小于15 nm间距的线型直接指导聚（2-乙烯基吡啶）-b-聚苯乙烯-b-聚（2-乙烯基吡啶）三嵌段共聚物的自组装

低分子量P2VP- b -PS- b -P2VP三嵌段共聚物（聚（2- vinlypyridine） -块-polystyrene-块-聚（2-乙烯基吡啶）]掺杂有氯化铜和微相分离的与超高区层状线图案密度。盐掺杂P2VP- b -PS- b -P2VP三嵌段共聚物自组装的纳米压印的光致抗蚀剂的模板的顶部，和金属纳米线具有长程有序与铂盐渗透和等离子体蚀刻制备。

更新日期：2015-06-18

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