Silica solubility and molecular speciation in hydrothermal water vapor have been determined through quartz solubility experiments at 400–800 °C and 50–270 bar using a novel U-tube flow-through reactor system and theoretical calculations. The results demonstrate that silica concentrations are low in water vapor (mSi,tot = 0.11–4.56 mmol/kg or xSi,tot = 8.21 × 10−5–1.98 × 10−6 mol/mol) increase with both temperature and pressure, which is attributed to the dissolution of quartz according to the reaction:

中文翻译：

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二氧化硅在 400–800 °C 水蒸气中的溶解度和分子形态


通过在 400-800 °C 和 50-270 bar 下使用新型 U 型管流通反应器系统和理论计算的石英溶解度实验，确定了二氧化硅在热液水蒸气中的溶解度和分子形态。结果表明，水蒸气中的二氧化硅浓度较低（mSi，tot = 0.11–4.56 mmol/kg 或 xSi，tot = 8.21 × 10−5–1.98 × 10−6 mol/mol）随温度和压力的增加而增加，这归因于根据反应石英的溶解：