Octafluoropropane (C3F8) electronic specialty gas is widely used in the process of etching and cleaning in semiconductor manufacturing industry. Removal of hexafluoropropylene (C3F6) impurities from C3F6/C3F8 mixtures thus is highly important but a formidable challenge since C3F6 and C3F8 possess similar physicochemical properties and molecular sizes. Herein we present a cobalt metal-organic framework (MOF) (termed as JXNU-21) constructed of 3-chloroisonicotinic ligands, featuring dangling 3-chloroisonicotinic ligands in the one-dimensional channels. Due to the rotation flexibility of the aromatic rings of the dangling 3-chloroisonicotinate ligands with uncoordinated nitrogen sites, the step-wise adsorption isotherms for the large-sized C3F8 were observed for JXNU-21. The high adsorption selectivity of 15.6 for C3F6/C3F8 (10:90) mixture and high C3F6 storage density (5.8 mmol g–1) under ambient conditions endow JXNU-21 with high potential for C3F6/C3F8 separation. The results of the breakthrough experiments show high-purity (99.999%) C3F8 gas can be achieved from a C3F6/C3F8 (10:90) mixture in one step. Additionally, the benchmark C3F8 productivity of 173.8 cm3 g–1 was obtained from the breakthrough experiments under ambient conditions, outperforming all other reported porous materials.

中文翻译：

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从六氟丙烯/八氟丙烷混合物中纯化八氟丙烷，具有高生产率的金属有机框架


八氟丙烷 （C3F8） 电子特种气体广泛用于半导体制造行业的刻蚀和清洗过程。因此，从 C3F6/C3F8 混合物中去除六氟丙烯 （C3F6） 杂质非常重要，但也是一项艰巨的挑战，因为 C3F6 和 C3F8 具有相似的物理化学性质和分子大小。在此，我们提出了一种由 3-氯异声碱配体构建的钴金属有机框架 （MOF）（称为 JXNU-21），在一维通道中具有悬垂的 3-氯异声碱配体。由于悬垂的 3-氯异烟酸配体的芳香环具有不协调的氮位点的旋转灵活性，因此观察到 JXNU-21 对大尺寸 C3F8 的逐步吸附等温线。JXNU-21 对 C3F6/C3F8 （10：90） 混合物的吸附选择性为 15.6，在环境条件下具有高 C3F6/C3F8 储存密度 （5.8 mmol g–1），因此具有很高的 C3F6/C3F8 分离潜力。突破性实验的结果表明，C3F6/C3F8 （10：90） 混合物可以一步获得高纯度 （99.999%） 的 C3F8 气体。此外，在环境条件下的突破性实验获得了 173.8 cm3 g-1 的基准 C3F8 生产率，优于所有其他已报道的多孔材料。