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Relationship between orbital moment anisotropy, magnetocrystalline anisotropy, and Dzyaloshinskii-Moriya interaction in W/Co/Pt trilayers
Physical Review B ( IF 3.2 ) Pub Date : 2024-11-07 , DOI: 10.1103/physrevb.110.184401
Zhendong Chi, Yong-Chang Lau, Vanessa Li Zhang, Goro Shibata, Shoya Sakamoto, Yosuke Nonaka, Keisuke Ikeda, Yuxuan Wan, Masahiro Suzuki, Masashi Kawaguchi, Masako Suzuki-Sakamaki, Kenta Amemiya, Naomi Kawamura, Masaichiro Mizumaki, Motohiro Suzuki, Hyunsoo Yang, Masamitsu Hayashi, Atsushi Fujimori

We have studied the Co layer thickness dependences of magnetocrystalline anisotropy (MCA), Dzyaloshinskii-Moriya interaction (DMI), and orbital moment anisotropy (OMA) in W/Co/Pt trilayers, in order to clarify their correlations with each other. We find that the MCA favors magnetization along the film normal and monotonically increases with decreasing effective magnetic layer thickness (𝑡eff). The magnitude of the Dzyaloshinskii-Moriya exchange constant (|𝐷|) increases with decreasing 𝑡eff until 𝑡eff1 nm, below which |𝐷| decreases. The MCA and |𝐷| scale with 1/𝑡eff for 𝑡eff larger than 1 nm, indicating an interfacial origin. The increase of MCA with decreasing 𝑡eff continues below 𝑡eff 1 nm, but with a slower rate. To clarify the cause of the 𝑡eff dependences of MCA and DMI, the OMA of Co in W/Co/Pt trilayers is studied using x-ray magnetic circular dichroism. We find nonzero OMA when 𝑡eff is smaller than 0.8 nm. The OMA increases with decreasing 𝑡eff more rapidly than what is expected from the MCA, indicating that factors other than OMA contribute to the MCA at small 𝑡eff. The 𝑡eff dependence of the OMA also suggests that |𝐷| at 𝑡eff smaller than 1 nm is not related to the OMA at the interface. We propose that the growth of Co on W results in a strain and/or texture that reduces the interfacial DMI, and, to some extent, MCA at small 𝑡eff.

中文翻译:


W/Co/Pt 三层中轨道矩各向异性、磁晶各向异性与 Dzyaloshinskii-Moriya 相互作用的关系



我们研究了磁晶各向异性 (MCA)、Dzyaloshinskii-Moriya 相互作用 (DMI) 和轨道矩各向异性 (OMA) 在 W/Co/Pt 三层中的钴层厚度依赖性,以阐明它们之间的相关性。我们发现 MCA 有利于沿薄膜法向磁化,并且随着有效磁层厚度 (teff) 的减小而单调增加。Dzyaloshinskii-Moriya 交换常数 (|D|) 的大小随着 teff 的减小而增加,直到 teff∼1 nm,低于该波长 |D| 时减小。MCA 和 |D| 刻度为 1/teff,对于大于 ∼1 nm 的 teff,表示界面起源。MCA 的增加随着 teff 的减少而继续在 teff∼ 1 nm 以下,但速率较慢。为了阐明 MCA 和 DMI 的画眉草依赖性的原因,使用 X 射线磁圆二色性研究了 W/Co/Pt 三层中 Co 的 OMA。当 teff 小于 ∼0.8 nm 时,我们发现 OMA 不为零。OMA 随着苔麸的减少而增加,其速度比 MCA 的预期要快,这表明 OMA 以外的因素对小苔麸的 MCA 有贡献。OMA 的 teff 依赖性还表明,小于 ∼1 nm 的 teff|D| 与界面处的 OMA 无关。 我们提出 Co 在 W 上的生长导致应变和/或质地,从而降低界面 DMI,并在一定程度上降低小苔麸下的 MCA。
更新日期:2024-11-08
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