npj Flexible Electronics ( IF 12.3 ) Pub Date : 2024-05-21 , DOI: 10.1038/s41528-024-00319-x Ruizi Li , Weiguo Zhu , Haoyang Wang , Yitong Jiao , Yuan Gao , Ruikun Gao , Riheng Wang , Hongxiao Chao , Aimin Yu , Xiaowang Liu
The thickness of the scintillation films in indirect X−ray detectors can significantly influence their luminescence intensity. However, due to the scattering and attenuation of incoherent photons, thick scintillation films tend to reduce light yield. Herein, a highly transparent perovskite glass−ceramic scintillation film, in which the CsPbBr3 nanocrystals are in-situ grown inside a transparent amorphous polymer structure, is designed to achieve ultrastable and efficient X-ray imaging. The crystal coordination−topology growth and in−situ film formation strategy is proposed to control the crystal growth and film thickness, which can prevent light scattering and non−uniform distribution of CsPbBr3 nanocrystals while providing sufficient film thickness to absorb X−ray, thus enabling a high−quality glass−ceramic scintillator without agglomeration and Ostwald ripening. This glass−ceramic scintillation film with a thickness of 250 μm achieves a low detection limit of 326 nGyair s−1 and a high spatial resolution of 13.9 lp mm−1. More importantly, it displays remarkable scintillation stability under X−ray irradiation (radiation intensity can still reach 95% at 278 μGyair s−1 for 3600 s), water soaking (150 days), and high−temperature storage (150 days at 60 °C). Hence, this work presents a approach to construct ultrastable and flexible scintillation films for X−ray imaging with reduced light scattering and improved resolution.
中文翻译:
超稳定、柔性玻璃陶瓷闪烁膜,减少光散射,实现高效 X 射线成像
间接 X 射线探测器中闪烁膜的厚度可以显着影响其发光强度。然而,由于非相干光子的散射和衰减,厚的闪烁膜往往会降低光输出。本文设计了一种高透明钙钛矿玻璃陶瓷闪烁薄膜,其中CsPbBr 3纳米晶体在透明无定形聚合物结构内原位生长,旨在实现超稳定和高效的X射线成像。提出了晶体配位拓扑生长和原位成膜策略来控制晶体生长和膜厚度,可以防止CsPbBr 3纳米晶体的光散射和不均匀分布,同时提供足够的膜厚度来吸收X射线,从而实现高质量的微晶玻璃闪烁体,而不会发生团聚和奥斯特瓦尔德熟化。这种厚度为250 μm的玻璃陶瓷闪烁膜实现了326 nGy air s -1的低检测限和13.9 lp mm -1的高空间分辨率。更重要的是,它在X射线照射(278 μGy空气s -1 3600 s下辐射强度仍可达到95%)、水浸泡(150天)和高温储存(60℃下150天)下表现出显着的闪烁稳定性。 ℃)。因此,这项工作提出了一种构建超稳定和柔性闪烁薄膜的方法,用于 X 射线成像,减少光散射并提高分辨率。