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Unconventional Doping Effect Leads to Ultrahigh Average Thermoelectric Power Factor in Cu3SbSe4-Based Composites
Advanced Materials ( IF 27.4 ) Pub Date : 2022-02-01 , DOI: 10.1002/adma.202109952
Yuling Huang 1 , Bin Zhang 2 , Jingwei Li 3 , Zizhen Zhou 1, 4 , Sikang Zheng 1 , Nanhai Li 1 , Guiwen Wang 2 , De Zhang 1 , Daliang Zhang 3 , Guang Han 5 , Guoyu Wang 6 , Xiaodong Han 7 , Xu Lu 1, 4 , Xiaoyuan Zhou 1, 2, 4
Affiliation  

Thermoelectric materials are typically highly degenerate semiconductors, which require high carrier concentration. However, the efficiency of conventional doping by replacing host atoms with alien ones is restricted by solubility limit, and, more unfavorably, such a doping method is likely to cause strong charge-carrier scattering at ambient temperature, leading to deteriorated electrical performance. Here, an unconventional doping strategy is proposed, where a small trace of alien atoms is used to stabilize cation vacancies in Cu3SbSe4 by compositing with CuAlSe2, in which the cation vacancies rather than the alien atoms provide a high density of holes. Consequently, the hole concentration enlarges by six times but the carrier mobility is well maintained. As a result, a record-high average power factor of 19 µW cm−1 K−2 in the temperature range of 300–723 K is attained. Finally, with further reduced lattice thermal conductivity, a peak zT value of 1.4 and a record-high average zT value of 0.72 are achieved within the diamond-like compounds. This new doping strategy not only can be applied for boosting the average power factor for thermoelectrics, but more generally can be used to maintain carrier mobility for a variety of semiconductors that need high carrier concentration.

中文翻译:

非常规掺杂效应导致 Cu3SbSe4 基复合材料中的超高平均热电功率因数

热电材料通常是高度简并的半导体,需要高载流子浓度。然而,通过用外来原子取代主体原子的常规掺杂效率受到溶解度限制的限制,更不利的是,这种掺杂方法可能会在环境温度下引起强烈的电荷载流子散射,从而导致电性能下降。在这里,提出了一种非常规的掺杂策略,其中少量外来原子用于 通过与 CuAlSe 2复合来稳定 Cu 3 SbSe 4中的阳离子空位,其中阳离子空位而不是外来原子提供高密度的空穴。因此,空穴浓度增加了六倍,但载流子迁移率保持良好。结果, 在 300–723 K 的温度范围内达到了创纪录的 19 µW cm -1  K -2的平均功率因数。最后,随着晶格热导率的进一步降低,在类金刚石化合物中实现了1.4 的峰值zT值和创纪录的 0.72 平均zT值。这种新的掺杂策略不仅可用于提高热电器件的平均功率因数,而且更普遍地可用于维持各种需要高载流子浓度的半导体的载流子迁移率。
更新日期:2022-02-01
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