A lamellar forming poly(styrene-stat-glycidyl methacrylate)-block-polylactide, P(S-s-GMA)-b-PLA, diblock polymer containing the photoacid generator 4-iodophenyldiphenylsulfonium triflate (IST) was heated above its order–disorder transition temperature, T_ODT, and subsequently irradiated with UV light to kinetically trap the disordered state by acid-catalyzed cross-linking through the reactive GMA units. We demonstrated that IST remained thermally stable over relevant cross-linking temperatures and times allowing for the independent control over both the thermally induced disordering process and the onset of cross-linking, in contrast to related thermal cross-linking agents. Post removal of the PLA component, the photocured samples displayed a high degree of nanoporosity across a broad cross-linking temperature range that extends to at least 75 °C above the T_ODT. In-situ photocuring during small-angle X-ray scattering revealed that the cross-linking reaction had a minimal effect on the domain structure. Finally, we demonstrated that highly selective ultrafiltration membranes could be fabricated by spin-coating a P(S-s-GMA)-b-PLA diblock polymer containing IST onto a commercial polysulfone support, irradiating with UV light in the disordered state, and removing the sacrificial PLA domains.

中文翻译：

---

使用热稳定的光致产酸剂在无序状态下临时控制嵌段聚合物的固化，以制备纳米多孔膜

层状形成聚（苯乙烯STAT -缩水甘油基甲基丙烯酸酯） -嵌段-polylactide，P（S-小号-GMA） - b -PLA，含有该光致酸生成4-三氟甲磺酸酯iodophenyldiphenylsulfonium（IST）二嵌段聚合物其有序-无序上述加热转变温度，T _ODT然后用紫外线照射，通过反应性GMA单元进行酸催化的交联，从而动态捕获无序状态。我们证明，与相关的热交联剂相比，IST在相关的交联温度和时间范围内保持热稳定，从而可以独立控制热诱导的无序过程和交联的开始。除去PLA成分后，光固化样品在较宽的交联温度范围内显示出高度的纳米孔隙度，该温度范围比T _ODT高至少75°C。小角度X射线散射过程中的原位光固化表明，交联反应对畴结构的影响最小。最后，我们证明了可以通过将包含IST的P（S- s -GMA）-b -PLA二嵌段聚合物旋涂到市售聚砜载体上，用无序状态的紫外线照射并去除来制备高选择性超滤膜。牺牲PLA域。