Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal.

EDITOR-IN-CHIEF
John F. Watts
School of Engineering
University of Surrey
Guildford
Surrey GU2 7XH, UK
Fax: +44 1483 876291
(Papers from UK only)

EUROPEAN EDITOR
Jose M. Sanz
Ciencia de Materiales
Universidad Autonoma de Madrid
Dept de Fisica Aplicada, C-XII
Cantoblanco
E-28049 Madrid, Spain
Fax: +34 91 49 73969
(Papers from the Rest of Europe)

NORTH AMERICAN EDITOR
Kateryna Artyushkova
Physical Electronics
18725 Lake Drive East, Chanhassen, MN 55317
USA


REVIEWS EDITOR
Don Baer
William R Wiley Environmental Molecular Sciences Laboratory
MSIN: K8-93, Pacific Northwest Laboratory
902 Batelle Boulevard
PO Box 999, Richland, WA 99352
USA
Fax:+1 509 376 5106

REGIONAL EDITORS (to support reviewing in native language and/or to support English improvement)
Japan:
Shingo Ichimura
Nagoya University
Furo-cho
Chikusa-ku, Nagoya,
Aichi 464-8601, Japan
Fax: +81-52-789-2041,
e:mail s.ichimura@aip.nagoya-u.ac.jp or s.ichimura@aist.go.jp

South East Asia and China:
Pan Ji-Sheng
Department of Physics
Faculty of Science
National University of Singapore
2 Science Drive 3
Singapore 117542
e-mail: js-pan@imre.a-star.edu.sg

ADVISORY BOARD
Marie-Laure Abel
University of Surrey

Guildford, UK

Morgan R. Alexander
University of Nottingham

Nottingham, UK

Dave Castner
University of Washington

Washington, U.S.A.

Paul K. Chu
City University of Hong Kong

Hong Kong

Peter Cumpson
UNSW Sydney

Australia

John Fletcher
University of Gothenburg

Gothenburg, Sweden

Julia E. Fulghum
University of New Mexico

New Mexico, U.S.A.

John T. Grant
University of Dayton

Ohio, USA

Alberto Herrera Gómez
CINVESTAV-Querétaro

Santiago de Querétaro, Mexico

Yoshikazu Homma
Tokyo University of Science

Japan

Lars Jeurgens
Empa

Dübendorf, Switzerland

Saulius Kaciulis
CNR-ISMN

Rome, Italy

Pavel Lejcek
Academy of Sciences of the Czech Republic

Czech Republic

David Morgan
Cardiff University

Cardiff U.K.

Cedric Powell
National Institute of Standards and Technology

Maryland, USA

Dipankar Das Sarma
Indian Association for the Cultivation of Science

Kolkata, India

Martin P. Seah
National Physical Laboratory

Middlesex, U.K.

Ryuichi Shimizu
Osaka University

Osaka, Japan

Rana Sodhi
University of Toronto

Ontario, Canada

Fred A. Stevie
North Carolina State University

North Carolina, U.S.A.

Shigeo Tanuma
National Institute for Materials Science (NIMS)

Ibaraki, Japan

Sven Mosbæk Tougaard
Univeristy of Southern Denmark

Odense, Denmark

Matthew S. Wagner
The Procter & Gamble Company

Ohio, USA

Andrew T. S. Wee
National University of Singapore

Singapore

Xinglong Wu
Nanjing University

Nanjing, P.R. China