个人简介
教 育 经 历
2000-01 ~ 2004-01 德国慕尼黑工业大学 电子工程 博士
工 作 经 历
2004-01 ~ 2009-01 英飞凌科技公司，德国中央研究部 器件专家
2009-01 ~ 2011-01 上海交通大学电子信息与电气工程学院 副教授
2011-01 ~ 至今 上海交通大学材料科学与工程学院 副教授
2017-01 ~ 至今 上海交通大学材料学院电子材料技术研究所 副所长
2019-01 ~ 至今 上海交通大学材料学院先进信息材料联合研究中心 副主任
研究领域
微电子技术
集成电路制造及可靠性分析，汽车电子技术
近期论文
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Book Silver Metal Organic Chemical Vapor Deposition for Microelectronic Metallization，2005，Shaker Verlag, ISBN 3-8322-3895-6 Journal Papers
L. Gao, C. Burmer: PLL soft functional failure analysis in advanced logic product using fault based analogue simulation and soft defect localization. Microelectronics Reliability 48 (2008) 1349-1353.
L. Gao, C. Burmer and F. Siegelin: ATPG scan logic failure analysis: a case study of logic ICs: fault isolation, defect mechanism identification and yield improvement. Microelectronics Reliability 46 (2006) 1458-1463.,
L. Gao, P. Haerter, Ch. Linsmeier, J. Gstoettner, R. Emling and D. Schmitt-Landsiedel: Metalorganic Chemical Vapor Deposition of Silver Thin Films for Future Interconnects by Direct Liquid Injection System. Materials Science in Semiconductor Processing, Vol. 7, 2004, 331-335 ,
L. Gao, J. Gstoettner, R. Emling, M. Balden, Ch. Linsmeier, A. Wiltner, W. Hansch, and D. Schmitt-Landsiedel: Thermal stability of titanium nitride diffusion barrier films for advanced silver interconnects. Microelectronic Engineering, 76 (2004) 76-81.
L. Gao, P. Haerter, Ch. Linsmeier, A. Wiltner, R. Emling and D. Schmitt-Landsiedel: Silver metal organic chemical vapor deposition for advanced silver metallization. Microelectronic Engineering 82 (2005) 296-300.
L. Gao, C. Burmer: PLL soft functional failure analysis in advanced logic product using fault based analogue simulation and soft defect localization. Microelectronics Reliability 48 (2008) 1349-1353.
L. Gao, C. Burmer and F. Siegelin: ATPG scan logic failure analysis: a case study of logic ICs: fault isolation, defect mechanism identification and yield improvement. Microelectronics Reliability 46 (2006) 1458-1463.,
L. Gao, P. Haerter, Ch. Linsmeier, A. Wiltner, R. Emling and D. Schmitt-Landsiedel: Silver metal organic chemical vapor deposition for advanced silver metallization. Microelectronic Engineering 82 (2005) 296-300.
L. Gao, P. Haerter, Ch. Linsmeier, J. Gstoettner, R. Emling and D. Schmitt-Landsiedel: Metalorganic Chemical Vapor Deposition of Silver Thin Films for Future Interconnects by Direct Liquid Injection System. Materials Science in Semiconductor Processing, Vol. 7, 2004, 331-335 ,
L. Gao, J. Gstoettner, R. Emling, M. Balden, Ch. Linsmeier, A. Wiltner, W. Hansch, and D. Schmitt-Landsiedel: Thermal stability of titanium nitride diffusion barrier films for advanced silver interconnects. Microelectronic Engineering, 76 (2004) 76-81.
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